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Sample throughput and time to data are becoming increasingly important.  The FEI Helios NanoLab™ 50 series DualBeam™  is unique in its ability to deliver the fastest TEM sample preparation performance in addition to providing highly flexible failure analysis capability on advanced (<20nm) semiconductor devices.  This SEM/FIB combines the most advanced scanning electron microscope (SEM) and focused ion beam (FIB) technologies with innovative gas chemistries, detectors and manipulators. Featuring unsurpassed SEM resolution, image quality and stunning Tomahawk™ FIB performance, imaging, milling or preparing samples is fast and easy for semiconductor and data storage labs, research facilities and industrial applications. (details)